Products & Services
Silicon Epitaxial Wafers
|Silicon Epitaxial Wafers are the core material used in manufacturing of a wide range of semiconductor devices with applications in consumer, industrial, military and space electronics.
Epiel provides a variety of production proven and industry standard Silicon Epitaxy process technologies for some of the most essential microelectronics applications:
To Integrated Circuit manufacturers Epiel offers Silicon Epitaxial Deposition Services on substrates with burried ion-implanted or diffused layers.
Silicon substrates are either purchased from major global vendors or supplied by customer.
Phone: +7 (499) 995 0049 E-mail: firstname.lastname@example.org
|Parameters range for Silicon Epi Wafers|
|Wafer diameter||76 mm, 100 mm, 150 mm, 200 mm|
|Substrate dopant||Antimony, Boron, Arsenic|
|Epi-layer thickness, µm||3,0 – 150|
|Epi-layer dopant||Phosphorous, Boron, Arsenic|
|Epi-layer resistivity, Ohm.cm||
|n-type||0,01 – 500|
|p-type||0,01 – 100|
|Single-layer structure types||n-n+, p-n+, p-p+, n-p+|
|Double-layer structure types||n1-n2-n+, n1-n2-p+, n-p-n+, p-n-p|
|Buried Layer Epi||Up to 3 buried layers|